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标题:High-quality surface passivation of silicon solar cells in an industrial-type inline plasma silicon nitride deposition system
时间:2019-05-16 11:05:39
DOI:10.1002/pip.523
作者:Jens D. Moschner;Jürgen Henze;Jan Schmidt;Rudolf Hezel
出版源: 《Progress in Photovoltaics Research & Applicati... ,2004 ,12 (1) :21-31
摘要:Abstract We have studied the surface passivation of silicon by deposition of silicon nitride (SiN) in an industrial-type inline plasma-enhanced chemical va...
大小:379 kb
页数:12 PAGES
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